Veeco GEN II
Location: Science and Engineering South, 109B
|UIC Cost||$na (per day)||$na (per day)|
|Other Academic||$na (per day)||$na (per day)|
|Non-Academic;||$na (per day)||$na (per day)|
The Applied Epi (now Veeco) GEN II MBE is a single-wafer molecular beam epitaxy system which is used to grow high purity metal oxide films. The growth chamber is held at ultra high vacuum and the metal oxide films are grown at a slow deposition rate which allows them to grow epitaxially. The instrument has 6 effusion cells dedicated to Ba, Fe, Cr, Bi, Sr & Ti and also an oxygen source. It was acquired, used, in 2004.